Vincent Shu
at ASML US Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Image processing, Photomasks, Machine learning, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Model-based design

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Photomasks, Optical proximity correction, SRAF, Mask making, Process modeling

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Electroluminescence, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Molybdenum, Astatine, Resolution enhancement technologies

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