Yongsheng Shu
at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Visualization, Error analysis, Photomasks, Optical proximity correction, Critical dimension metrology, Algorithm development, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 20, 1997
Proc. SPIE. 2921, International Conference on Experimental Mechanics: Advances and Applications
KEYWORDS: Reflectors, Refractive index, Water, Glasses, Image processing, Computing systems, Motion detection, Charge-coupled devices, Motion models, CCD image sensors

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