Dr. Vincent Truffert
R&D Engineer in Optical Lithography at imec
SPIE Involvement:
Publications (19)

Proceedings Article | 1 December 2023 Presentation + Paper
Proceedings Volume PC12750, PC127500Q (2023) https://doi.org/10.1117/12.2687017
KEYWORDS: Semiconducting wafers, Contamination, Scanners, Optical lithography, Particles, Extreme ultraviolet, Displays, Extreme ultraviolet lithography, Inspection, Critical dimension metrology

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275006 (2023) https://doi.org/10.1117/12.2685543
KEYWORDS: Semiconducting wafers, Stochastic processes, Nanoimprint lithography, Printing, Line width roughness, Simulations, Optical lithography, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet

Proceedings Article | 29 May 2023 Presentation + Paper
Proceedings Volume 12498, 1249809 (2023) https://doi.org/10.1117/12.2658418
KEYWORDS: Semiconducting wafers, Particles, Contamination, Extreme ultraviolet lithography, Scanners, Displays, Extreme ultraviolet, Printing, Industry, Optical lithography

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12292, 122920A (2022) https://doi.org/10.1117/12.2640647
KEYWORDS: Photoresist processing, Metrology, Stochastic processes, Extreme ultraviolet lithography, Lithographic process control

Proceedings Article | 26 May 2022 Presentation + Paper
Gian Francesco Lorusso, Christophe Beral, Janusz Bogdanowicz, Danilo De Simone, Mahmudul Hasan, Christiane Jehoul, Alain Moussa, Mohamed Saib, Mohamed Zidan, Joren Severi, Vincent Truffert, Dieter Van den Heuvel, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Joey Hung, Roy Koret, Igor Turovets, Kit Ausschnitt, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 120530O (2022) https://doi.org/10.1117/12.2614046
KEYWORDS: Fourier transforms, Signal to noise ratio, Metrology, Line width roughness, Scanning electron microscopy, Semiconducting wafers, Atomic force microscopy, Scatterometry, Extreme ultraviolet lithography, Image quality

Showing 5 of 19 publications
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