Dr. Vincent Truffert
R&D Engineer in Optical Lithography at IMEC
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | October 8, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Reticles, Metrology, Optical lithography, Data modeling, Scanners, Inspection, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Etching, Polymers, Glasses, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Etching, Metals, Image processing, Photomasks, Immersion lithography, Source mask optimization, Semiconducting wafers

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | October 1, 2010
JM3 Vol. 9 Issue 04
KEYWORDS: Photomasks, Printing, Scanning electron microscopy, Etching, Double patterning technology, Optical lithography, Semiconducting wafers, Lithography, Electroluminescence, Metals

Showing 5 of 13 publications
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