Dr. Vincent Wiaux
Manager Advanced Lithography at IMEC
SPIE Involvement:
Conference Program Committee | Author
Publications (44)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Microscopes, Reticles, Stereoscopy, Solids, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, 3D image processing

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Image processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Optical lithography, Data modeling, Calibration, Resistance, 3D modeling, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Reticles, Logic, Metals, Scanners, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Tolerancing, Standards development

SPIE Journal Paper | September 4, 2013
JM3 Vol. 12 Issue 04
KEYWORDS: Line width roughness, Optical lithography, Etching, Line edge roughness, Photomasks, Silicon, Extreme ultraviolet lithography, Plasma, Plasma enhanced chemical vapor deposition, Lithography

Showing 5 of 44 publications
Conference Committee Involvement (1)
Photomask Technology
18 September 2007 | Monterey, California, United States
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