Mr. Vineet V. Nair Profile

Vineet V. Nair

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Publications (7)

SPIE Journal Paper | 27 May 2021

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gökay Yeğen, Par Broman

JM3, Vol. 20, Issue 02, 021005, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021005

KEYWORDS: Pellicles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Semiconducting wafers, Scattering, Reticles, Particles, Line width roughness

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Proceedings Article | 23 February 2021 Presentation + Paper

CNT pellicles: imaging results of the first full-field EUV exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve Van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gokay Yeğen, Pär Broman

Proceedings Volume 11609, 116090Z (2021) https://doi.org/10.1117/12.2584724

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Proceedings Article | 22 February 2021 Presentation + Paper

Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align

Joost Bekaert, Joern-Holger Franke, Andreas Frommhold, Natalia Davydova, Remko Aubert, Vineet Vijayakrishnan Nair, Tatiana Kovalevich, David Rio, Erik Wang, Gijsbert Rispens, Mark Maslow, Eric Hendrickx

Proceedings Volume 11609, 116090R (2021) https://doi.org/10.1117/12.2584733

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Proceedings Article | 4 January 2021 Presentation + Paper

Tomorrow’s pitches on today’s 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes

Joern-Holger Franke, Natalia Davydova, Joost Bekaert, Vincent Wiaux, Vineet Vijayakrishnan Nair, Andre van Dijk, Erik Wang, Mark Maslow, Eric Hendrickx

Proceedings Volume 11517, 1151716 (2021) https://doi.org/10.1117/12.2573073

KEYWORDS: Scanners, Extreme ultraviolet lithography, Etching, Metrology, Photomasks, Image quality, Semiconducting wafers, Semiconductors, Optical lithography, Ecosystems

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Proceedings Article | 4 November 2020 Presentation + Paper

Study of EUV reticle storage effects through exposure on EBL2 and NXE

Rik Jonckheere, Vineet Nair, Eric Hendrickx, Remko Aubert, Chien-Ching Wu, Veronique de Rooij-Lohmann, Henk Lensen, Dorus Elstgeest, Victor Soltwisch, Claudia Zech, Philipp Hönicke, Michael Kolbe, Frank Scholze

Proceedings Volume 11517, 115170Z (2020) https://doi.org/10.1117/12.2573125

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

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Proceedings Article | 13 October 2020 Presentation + Paper

Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry

Vineet Vijayakrishnan Nair, Lieve Van Look , Remko Aubert, Eric Hendrickx

Proceedings Volume 11517, 115170O (2020) https://doi.org/10.1117/12.2572993

KEYWORDS: Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Ellipsometry, EUV optics, Metrology, Calibration, Photomasks, Critical dimension metrology, Time metrology

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Proceedings Article | 23 March 2020 Presentation + Paper

Novel monitoring of EUV litho cluster for manufacturing insertion

Vincent Truffert, Kit Ausschnitt, Vineet V. Nair, Koen D'Havé

Proceedings Volume 11323, 113230S (2020) https://doi.org/10.1117/12.2551881

KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Metrology, Manufacturing, Stochastic processes, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Line width roughness, Line edge roughness, Optical simulations, Scatterometry

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Showing 5 of 7 publications

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