Vineet V. Nair
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 23 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 4 January 2021 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Scanners, Extreme ultraviolet lithography, Etching, Metrology, Photomasks, Image quality, Semiconducting wafers, Semiconductors, Optical lithography, Ecosystems

Proceedings Article | 4 November 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

Proceedings Article | 13 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Ellipsometry, EUV optics, Metrology, Calibration, Photomasks, Critical dimension metrology, Time metrology

Showing 5 of 6 publications
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