Dr. Vishnu Kamat
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Data modeling, Image processing, Electroluminescence, 3D modeling, Photomasks, Source mask optimization, Nanoimprint lithography, Semiconducting wafers, Standards development

Proceedings Article | 5 April 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Source mask optimization, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Data modeling, Calibration, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Contrast sensitivity, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Photomasks, Double patterning technology, Source mask optimization, Nanoimprint lithography, System on a chip, Fiber optic illuminators

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Scanning electron microscopy, Photomasks, Plasma etching, Systems modeling, Process modeling

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithium, Lithographic illumination, Diffractive optical elements, Image processing, Manufacturing, Photomasks, Source mask optimization, SRAF, Nanoimprint lithography, Model-based design

Showing 5 of 18 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top