Vitaly V. Chernik
Researcher at NANOTECH SWHL GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, 3D image reconstruction, Digital holography, Spatial light modulators, Micromirrors, Photomasks, Maskless lithography

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Diffraction, Holograms, Holography, 3D image reconstruction, Manufacturing, Photoresist materials, Image quality, Photomasks, Algorithm development

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Holograms, Holography, Optical lithography, 3D image reconstruction, Digital holography, Image resolution, Photoresist materials, Photomasks

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Diffraction, Holograms, Holography, 3D image reconstruction, Digital holography, Image quality, Software development, Photomasks, Algorithm development, Phase shifts

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Microelectromechanical systems, Lithography, Light sources, Holography, Cameras, Photomasks, Helium cadmium lasers

Showing 5 of 8 publications
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