Dr. Vitaly Domnenko Profile

Dr. Vitaly Domnenko

Staff R&D Engineer

SPIE Involvement:

Author

Area of Expertise:

computational lithography , optical image formation , resolution enhancement technique , source mask optimization , electro-magnetic solvers , rigorous simulations

Publications (16)

Proceedings Article | 4 April 2019 Paper

Paper

EUV computational lithography using accelerated topographic mask simulation

Vitaly Domnenko, Bernd Küchler, Wolfgang Hoppe, Jürgen Preuninger, Ulrich Klostermann, Wolfgang Demmerle, Martin Bohn, Dietmar Krüger, Ryoung Ryoung Han Kim, Ling Ee Tan

Proceedings Volume 10962, 109620O (2019) https://doi.org/10.1117/12.2515668

KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Computational lithography, 3D modeling, Computer simulations, Optical proximity correction, Performance modeling, Photoresist processing, Resolution enhancement technologies

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Proceedings Article | 20 March 2018 Paper

Paper

Rigorous ILT optimization for advanced patterning and design-process co-optimization

Kosta Selinidis, Bernd Kuechler, Howard Cai, Kyle Braam, Wolfgang Hoppe, Vitaly Domnenko, Amyn Poonawala, Guangming Xiao

Proceedings Volume 10587, 105870M (2018) https://doi.org/10.1117/12.2299375

KEYWORDS: Photomasks, Lithography, Optical lithography, 3D modeling, Optical proximity correction, Calibration, Photoresist processing, Manufacturing, Computer simulations, Source mask optimization

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Proceedings Article | 27 March 2014 Paper

Paper

Numerical analysis for resist profile after thermal process in display manufacturing

Vitaliy Domnenko, Hans-Jürgen Stock, Sangmin Shin, Jonghyoek Ryu, Sung Won Choi, Hyunwoo Cho, Eun-Soo Jeong, Jung-Hoe Choi

Proceedings Volume 9051, 90511P (2014) https://doi.org/10.1117/12.2046638

KEYWORDS: Photoresist processing, Polymers, Data modeling, Calibration, Manufacturing, Solids, 3D modeling, Numerical analysis, Crystals, Materials processing

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Proceedings Article | 13 March 2012 Paper

Paper

Source-mask optimization incorporating a physical resist model and manufacturability constraints

Thomas Mülders, Vitaliy Domnenko, Bernd Küchler, Hans-Jürgen Stock, Ulrich Klostermann, Peter De Bisschop

Proceedings Volume 8326, 83260G (2012) https://doi.org/10.1117/12.914047

KEYWORDS: Source mask optimization, Photomasks, Optimization (mathematics), SRAF, Manufacturing, Photoresist processing, Printing, Calibration, Lithography, Semiconducting wafers

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Proceedings Article | 13 March 2012 Paper

Paper

Computational process optimization of array edges

Bernd Küchler, Artem Shamsuarov, Thomas Mülders, Ulrich Klostermann, Seung-Hune Yang, Seongho Moon, Vitaliy Domnenko, Sung-Woon Park

Proceedings Volume 8326, 83260H (2012) https://doi.org/10.1117/12.916528

KEYWORDS: SRAF, Source mask optimization, Tolerancing, Array processing, Photomasks, Printing, Optimization (mathematics), Manufacturing, Lithography, Optical proximity correction

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Proceedings Article | 20 May 2011 Paper

Paper

Role of ellipsometry in DPT process characterization and impact of performance for contact holes

Itaru Kamohara, Vitaliy Domnenko, Alexander Philippou

Proceedings Volume 8081, 80810R (2011) https://doi.org/10.1117/12.899901

KEYWORDS: Ellipsometry, Lithography, Semiconducting wafers, Signal processing, Signal detection, Diffraction, Etching, Photoresist processing, Nanoimprint lithography, Wafer-level optics

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Proceedings Article | 23 March 2011 Paper

Paper

Source and mask optimization applications in manufacturing

ChinTeong Lim, Vlad Temchenko, Ulrich Klostermann, Vitaliy Domnenko, Jens Schneider, Daniel Sarlette, Ingo Meusel, Dieter Kaiser, Ralf Ploss

Proceedings Volume 7973, 797322 (2011) https://doi.org/10.1117/12.879203

KEYWORDS: Optical proximity correction, Source mask optimization, Scanners, Lithography, Photomasks, Manufacturing, Photovoltaics, Fiber optic illuminators, Reticles, Resolution enhancement technologies

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Proceedings Article | 25 September 2010 Paper

Paper

Simultaneous source-mask optimization: a numerical combining method

Thomas Mülders, Vitaliy Domnenko, Bernd Küchler, Thomas Klimpel, Hans-Jürgen Stock, Amyn Poonawala, Kunal Taravade, William Stanton

Proceedings Volume 7823, 78233X (2010) https://doi.org/10.1117/12.865965

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Electroluminescence, Image processing, Lithography, Semiconducting wafers, Cadmium sulfide, Optimization (mathematics), Manufacturing

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Proceedings Article | 4 March 2010 Paper

Paper

The role of mask topography effects in the optimization of pixelated sources

Vitaliy Domnenko, Bernd Küchler, Thomas Mülders, Thomas Schmöller, Hans-Jürgen Stock, Georg Viehöver

Proceedings Volume 7640, 76401X (2010) https://doi.org/10.1117/12.845759

KEYWORDS: Photomasks, Optimization (mathematics), Polarization, Nanoimprint lithography, Lithographic illumination, Diffraction, Lithography, Semiconducting wafers, Tolerancing, Error analysis

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Proceedings Article | 18 March 2009 Paper

Paper

Analysis of EUVL mask effects under partially coherent illumination

Vitaly Domnenko, Thomas Schmoeller, Thomas Klimpel

Proceedings Volume 7271, 727141 (2009) https://doi.org/10.1117/12.813644

KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet lithography, Lithographic illumination, Extreme ultraviolet, Diffraction, Image processing, Lithography, Molybdenum, Silicon

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Proceedings Article | 1 November 2007 Paper

Paper

OPC verification on cell level using fully rigorous mask topography simulation

Vitaly Domnenko, Thomas Klimpel, Georg Viehoever, Hans Koop, Lawrence Melvin, Thomas Schmoeller

Proceedings Volume 6730, 67304J (2007) https://doi.org/10.1117/12.746625

KEYWORDS: Photomasks, Optical proximity correction, Finite-difference time-domain method, Lithography, 3D modeling, Image processing, Polarization, Electromagnetism, 3D acquisition, 3D image processing

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Proceedings Article | 18 February 2004 Paper

Paper

New object-oriented model of an arbitrary optical system

Vitaly Domnenko, Tatiana Ivanova, Maria Gantvorg

Proceedings Volume 5249, (2004) https://doi.org/10.1117/12.512719

KEYWORDS: Optical components, Data modeling, Optical design, Software development, Systems modeling, Mathematical modeling, Ray tracing, Zoom lenses, Optical design software, Chemical elements

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Proceedings Article | 27 September 1999 Paper

Paper

Computer simulation of a partially coherent image based on the vector theory of diffraction

Vitaly Domnenko

Proceedings Volume 3780, (1999) https://doi.org/10.1117/12.363774

KEYWORDS: Diffraction, Polarization, Computer simulations, Mathematical modeling, Image acquisition, Superposition, Optical filters, Systems modeling, Fourier transforms, Coherence imaging

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Proceedings Article | 25 February 1999 Paper

Paper

New approach to optical measurements of small objects with superresolution

Vadim Veiko, Nikolay Voznesensky, Vitaly Domnenko, Alexey Goussev, Tatyana Ivanova, Sergey Rodionov

Proceedings Volume 3736, (1999) https://doi.org/10.1117/12.340137

KEYWORDS: Visible radiation, Super resolution, Fourier transforms, Light sources, Mathematical modeling, Optical testing, Spatial frequencies, Zernike polynomials, Near field optics, Near field

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Proceedings Article | 13 October 1998 Paper

Paper

New approach to analysis of subwavelength-sized secondary light sources

Nikolay Voznesensky, Vadim Veiko, Vitaly Domnenko, Alexey Goussev, Tatyana Ivanova, Sergey Rodionov

Proceedings Volume 3467, (1998) https://doi.org/10.1117/12.326833

KEYWORDS: Light sources, Near field scanning optical microscopy, Visible radiation, Near field, Near field optics, Fourier transforms, Super resolution, Spatial frequencies, Light wave propagation, Polarization

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Proceedings Article | 11 April 1997 Paper

Paper

Method of computer-controlled microlens processing and testing

Sergey Rodionov, Vadim Veiko, Alexander Shakola, Vitaly Domnenko, Vadim Patlaty

Proceedings Volume 3008, (1997) https://doi.org/10.1117/12.271428

KEYWORDS: Optics manufacturing, Manufacturing, Microlens, Process control, Optical components, Zernike polynomials, Mirrors, Helium neon lasers, Charge-coupled devices, Ray tracing

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Showing 5 of 16 publications

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