Dr. Vitaly Domnenko
Staff R&D Engineer
SPIE Involvement:
Area of Expertise:
computational lithography , optical image formation , resolution enhancement technique , source mask optimization , electro-magnetic solvers , rigorous simulations
Publications (16)

Proceedings Article | 4 April 2019 Paper
Vitaly Domnenko, Bernd Küchler, Wolfgang Hoppe, Jürgen Preuninger, Ulrich Klostermann, Wolfgang Demmerle, Martin Bohn, Dietmar Krüger, Ryoung Ryoung Han Kim, Ling Ee Tan
Proceedings Volume 10962, 109620O (2019) https://doi.org/10.1117/12.2515668
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Computational lithography, 3D modeling, Computer simulations, Optical proximity correction, Performance modeling, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 20 March 2018 Paper
Proceedings Volume 10587, 105870M (2018) https://doi.org/10.1117/12.2299375
KEYWORDS: Photomasks, Lithography, Optical lithography, 3D modeling, Optical proximity correction, Calibration, Photoresist processing, Manufacturing, Computer simulations, Source mask optimization

Proceedings Article | 27 March 2014 Paper
Vitaliy Domnenko, Hans-Jürgen Stock, Sangmin Shin, Jonghyoek Ryu, Sung Won Choi, Hyunwoo Cho, Eun-Soo Jeong, Jung-Hoe Choi
Proceedings Volume 9051, 90511P (2014) https://doi.org/10.1117/12.2046638
KEYWORDS: Photoresist processing, Polymers, Data modeling, Calibration, Manufacturing, Solids, 3D modeling, Numerical analysis, Crystals, Materials processing

Proceedings Article | 13 March 2012 Paper
Thomas Mülders, Vitaliy Domnenko, Bernd Küchler, Hans-Jürgen Stock, Ulrich Klostermann, Peter De Bisschop
Proceedings Volume 8326, 83260G (2012) https://doi.org/10.1117/12.914047
KEYWORDS: Source mask optimization, Photomasks, Optimization (mathematics), SRAF, Manufacturing, Photoresist processing, Printing, Calibration, Lithography, Semiconducting wafers

Proceedings Article | 13 March 2012 Paper
Bernd Küchler, Artem Shamsuarov, Thomas Mülders, Ulrich Klostermann, Seung-Hune Yang, Seongho Moon, Vitaliy Domnenko, Sung-Woon Park
Proceedings Volume 8326, 83260H (2012) https://doi.org/10.1117/12.916528
KEYWORDS: SRAF, Source mask optimization, Tolerancing, Array processing, Photomasks, Printing, Optimization (mathematics), Manufacturing, Lithography, Optical proximity correction

Showing 5 of 16 publications
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