Dr. Vitaly Domnenko
R&D Application Engineer at Synopsys SPb LLC
SPIE Involvement:
Author
Area of Expertise:
computational lithography , optical image formation , resolution enhancement technique , source mask optimization , electro-magnetic solvers , rigorous simulations
Publications (15)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Calibration, Manufacturing, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Photoresist processing

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Data modeling, Calibration, Polymers, Crystals, Materials processing, Manufacturing, 3D modeling, Numerical analysis, Solids, Photoresist processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Manufacturing, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Tolerancing, Array processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Calibration, Manufacturing, Printing, Photomasks, Source mask optimization, SRAF, Optimization (mathematics), Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Wafer-level optics, Ellipsometry, Lithography, Diffraction, Etching, Signal processing, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Reticles, Scanners, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Resolution enhancement technologies, Fiber optic illuminators

Showing 5 of 15 publications
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