Vito Daniele Rutigliani
Process Metrology Eng at ASML
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Linear filtering, Scanning electron microscopy, Photomasks, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Logic, Error analysis, Copper, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Overlay metrology, Process modeling

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Signal to noise ratio, Edge detection, Data modeling, Image processing, Denoising, Interference (communication), Scanning electron microscopy, Image filtering, Image denoising, Line edge roughness

SPIE Journal Paper | 10 November 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Scanning electron microscopy, Line edge roughness, Materials processing, Extreme ultraviolet, Line width roughness, Etching, Lithography, Image filtering, Material characterization, Image acquisition

SPIE Journal Paper | 13 October 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Fractal analysis, Metrology, Edge roughness, Etching, Lithography, Image processing, Optical lithography, Image segmentation

Showing 5 of 13 publications
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