Dr. Vivek Bakshi
President at EUV Litho Inc
SPIE Involvement:
Conference Program Committee | Journal Editorial Board Member | Editor | Author | Instructor
Area of Expertise:
EUV Lithography , Lithography , Semiconductor Manufacturing , Plasma Machines , Plasma Diagnostics
Profile Summary

Dr. Vivek Bakshi is the president of EUV Litho, Inc., an organization that he formed to promote EUV Lithography via consulting, workshops and education courses. He is a consultant in the area of EUV Lithography and lithography in general. He provides consulting services to investors, funding agencies, universities, national labs and suppliers. He also organizes International Workshop on EUV Lithography, EUV and Soft X-ray Sources and teaches EUV Lithography short courses around the world.

Previously, he was a senior member of the technical staff in SEMATECH’s Lithography Division. Dr. Bakshi has authored/co-authored over 125 technical publications, including book chapters, articles in the peer-reviewed journals, technical reports and trade publications. He has edited two books on EUV Lithography: EUV Sources for Lithography (SPIE Press, 2006) and EUV Lithography (SPIE Press, 2008). He is currently Associate Editor of JM3 (SPIE Journal of Micro/Nano Lithography, MEMS and MOEMS) and Blogger at SST (http://www.electroiq.com/blogs/euvl-focus.html).
Publications (13)

SPIE Press Editor | February 8, 2018

SPIE Journal Paper | December 27, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical lithography, Pellicles, Inspection, Optical proximity correction, Free electron lasers, Printing, Scanners

SPIE Journal Paper | June 13, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Metrology, Optical lithography, Semiconductor manufacturing, Laser applications, Laser metrology, High volume manufacturing, Integrated circuits

SPIE Journal Paper | October 1, 2007
JM3 Vol. 6 Issue 04
KEYWORDS: Ions, Particles, Extreme ultraviolet, Magnetism, Monte Carlo methods, Systems modeling, Plasma, Tin, Argon, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Mirrors, Electrodes, Scanners, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Mirrors, Chemical species, Particles, Ions, Reflectivity, Extreme ultraviolet, Palladium, Extreme ultraviolet lithography, Ruthenium, Tin

Showing 5 of 13 publications
Conference Committee Involvement (3)
Emerging Lithographic Technologies XII
26 February 2008 | San Jose, California, United States
Emerging Lithographic Technologies XI
27 February 2007 | San Jose, California, United States
Emerging Lithographic Technologies X
21 February 2006 | San Jose, California, United States
Course Instructor
SC888: EUV Lithography
This course provides attendees with a full overview of the fundamentals, current status, and technical challenges of EUV Lithography. Topics covered include EUV Sources, EUV Source Metrology, EUV Optics, EUV systems and patterning, and EUV Mask. We will begin with an overview of the history of EUVL and cover EUV sources, EUV source metrology and EUV optics. Next is a discussion of EUVL systems and patterning. We cover the fundamental components of EUV systems and address similarities and differences to optical lithography systems. This section also covers patterning issues including flare, LER, and resist performance. We continue with an exploration of EUVL Mask technology issues such as design, materials including reflective multilayers, process and metrology. Finally we conclude with a Status Review of EUVL. Course material will be drawn from the accompanying texts EUV Sources for Lithography and EUV Lithography.
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