Vivien Wang
Senior Application Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Metrology, Etching, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Critical dimension metrology, Birefringence, Distance measurement, Process control, Lithography, Scanning electron microscopy

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Scanners, Scatterometry, 3D metrology, Finite element methods, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Back end of line

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Signal to noise ratio, Lithography, Metrology, Metals, Scanners, Scatterometry, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Carbon, Lithography, Refractive index, Birefringence, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Absorption, Anisotropy

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Scanners, Scatterometry, Finite element methods, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 8 publications
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