Vlad Temchenko
Process Engineer at Micron Technology Inc
SPIE Involvement:
Author
Area of Expertise:
Simulation of lithographic processes , Critical dimension and overlay metrology , Optical Proximity Correction , RET for lithographic processes
Publications (10)

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 797322 (2011) https://doi.org/10.1117/12.879203
KEYWORDS: Optical proximity correction, Source mask optimization, Scanners, Lithography, Photomasks, Manufacturing, Photovoltaics, Fiber optic illuminators, Reticles, Resolution enhancement technologies

Proceedings Article | 4 March 2010 Paper
Jens Schneider, Andreas Greiner, ChinTeong Lim, Vlad Temchenko, Felix Braun, Dieter Kaiser, Tarja Hauck, Ingo Meusel, Dietrich Burmeister, Stephan Loehr, Susanne Volkland, Astrid Bauch, Hendrik Kirbach, Daniel Sarlette, Katrin Thiede
Proceedings Volume 7640, 76403G (2010) https://doi.org/10.1117/12.848207
KEYWORDS: Resolution enhancement technologies, Lithography, Optical proximity correction, Semiconducting wafers, Image processing, 193nm lithography, Chemical reactions, Scanners, Etching, Design for manufacturing

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 764034 (2010) https://doi.org/10.1117/12.845464
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Photovoltaics, Inspection, Manufacturing, Logic, 193nm lithography, Optical lithography, Reticles

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727439 (2009) https://doi.org/10.1117/12.814144
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Resolution enhancement technologies, Manufacturing, Lithographic illumination, Semiconducting wafers, Logic, 193nm lithography, Silicon

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 69240W (2008) https://doi.org/10.1117/12.772572
KEYWORDS: Photomasks, Finite-difference time-domain method, Near field, Optical proximity correction, Polarization, Interfaces, 3D modeling, Lithography, Computer simulations, Semiconducting wafers

Showing 5 of 10 publications
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