Vlad Temchenko
Senior Process Engineer at Micron Technology Inc
SPIE Involvement:
Author
Area of Expertise:
Simulation of lithographic processes , Critical dimension and overlay metrology , Optical Proximity Correction , RET for lithographic processes
Publications (10)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Reticles, Scanners, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Etching, Image processing, Scanners, Design for manufacturing, Optical proximity correction, Chemical reactions, Semiconducting wafers, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Photovoltaics, Reticles, Logic, Optical lithography, Manufacturing, Inspection, Photomasks, Optical proximity correction, 193nm lithography

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Logic, Lithographic illumination, Silicon, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Finite-difference time-domain method, Polarization, Interfaces, Computer simulations, 3D modeling, Near field, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Data modeling, Calibration, Etching, Design for manufacturing, Optical proximity correction, Critical dimension metrology, Photoresist processing, Optics manufacturing, Process modeling

Showing 5 of 10 publications
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