Prof. Vladimir Mikhailovich Borisov Profile

Prof. Vladimir Mikhailovich Borisov

Head of Lab.

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Author

Publications (14)

Proceedings Article | 12 April 2007 Paper

Discharge produced plasma source for EUV lithography

V. Borisov, A. Eltzov, A. Ivanov, O. Khristoforov, Yu. Kirykhin, A. Vinokhodov, V. Vodchits, V. Mishhenko, A. Prokofiev

Proceedings Volume 6611, 66110B (2007) https://doi.org/10.1117/12.740590

KEYWORDS: Extreme ultraviolet, Tin, Plasma, Electrodes, Xenon, Extreme ultraviolet lithography, Ions, Liquids, Lithography, Manufacturing

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Proceedings Article | 15 March 2007 Paper

EUV source development for high-volume chip manufacturing tools

Uwe Stamm, Masaki Yoshioka, Jürgen Kleinschmidt, Christian Ziener, Guido Schriever, Max Schürmann, Guido Hergenhan, Vladimir Borisov

Proceedings Volume 6517, 65170P (2007) https://doi.org/10.1117/12.712136

KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Tin, Extreme ultraviolet lithography, Xenon, Prototyping, Manufacturing, Integrated optics, Laser applications

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Proceedings Article | 23 March 2006 Paper

Development status of EUV sources for use in Beta-tools and high-volume chip manufacturing tools

U. Stamm, J. Kleinschmidt, Denis Bolshukhin, J. Brudermann, G. Hergenhan, V. Korobotchko, B. Nikolaus, M. Schürmann, G. Schriever, C. Ziener, V. Borisov

Proceedings Volume 6151, 61510O (2006) https://doi.org/10.1117/12.652989

KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Xenon, Tin, Manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Hydrogen, Prototyping

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In the paper we give an update about the development status of gas discharge produced plasma (GDPP) EUV sources at XTREME technologies. Already in 2003 first commercial prototypes of xenon GDPP sources of the type XTS 13-35 based on the Z-pinch with 35 W power in 2π sr have been delivered and integrated into micro-exposure tools from Exitech, UK. The micro-exposure tools with these sources have been installed in industry in 2004. The first tool has made more than 100 million pulses without visible degradation of the source collector optics. For the next generation of full-field exposure tools (we call it Beta-tools) we develop GDPP sources with power of > 10 W in intermediate focus. Also these sources use xenon as fuel which has the advantage of not introducing additional contaminations. Here we describe basic performance of these sources as well as aspects of collector integration and debris mitigation and optics lifetime. To achieve source performance data required for high volume chip manufacturing we consider tin as fuel for the source because of its higher conversion efficiency compared to xenon. While we had earlier reported an output power of 400 W in 2π sr from a tin source we could reach meanwhile 800 W in 2π sr from the source in burst operation. Provided a high power collector is available with a realistic collector module efficiency of between 9% and 15 % these data would support 70-120 W power in intermediate focus. However, we do not expect that the required duty cycle and the required electrode lifetimes can be met with this standing electrode design Z-pinch approach. To overcome lifetime and duty cycle limitations we have investigated GDPP sources with tin fuel and rotating disk electrodes. Currently we can generate more than 200 W in 2π sr with these sources at 4 kHz repetition rate. To achieve 180 W power in intermediate focus which is the recent requirement of some exposure tool manufacturers this type of source needs to operate at 21-28 kHz repetition rate which may be not possible by various reasons. In order to make operation at reasonable repetition rates with sufficient power possible we have investigated various new excitation concepts of the rotating disk electrode configurations. With one of the concepts pulse energies above 170 mJ in 2π sr could be demonstrated. This approach promises to support 180 W intermediate focus power at repetition rates in the range between 7 and 10 kHz. It will be developed to the next power level in the following phase of XTREME technologies' high volume manufacturing source development program.

Proceedings Article | 29 July 2004 Paper

Pulsed lasers operating from UV to IR at TRINITI for possible medical applications

Anatoly Rodin, Vladimir Borisov, Victor Kuz'min, Vladimir Mezhevov

Proceedings Volume 5486, (2004) https://doi.org/10.1117/12.572448

KEYWORDS: Pulsed laser operation, Laser dentistry, Ultraviolet radiation, Gas lasers, Electrodes, Laser applications, Laser development, Carbon dioxide lasers, Absorption, Lasers

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Proceedings Article | 16 June 2004 Paper

Recent advances in the development of coherent and incoherent UV and EUV discharge sources

Vladimir Borisov, Andrei Demin, A. Eltzov, Alexander Ivanov, Oleg Khristoforov, Yuriy Kirykhin, Aleksandr Vinokhodov, V. Vodchits, Valentin Mischenko, Alexander Prokofiev

Proceedings Volume 5479, (2004) https://doi.org/10.1117/12.558204

KEYWORDS: Extreme ultraviolet, Plasma, Excimer lasers, Xenon, Ultraviolet radiation, Pulsed laser operation, Lithography, Gas lasers, High power lasers, Mirrors

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Proceedings Article | 6 October 2003 Paper

Development of next generation excimer lasers for industrial applications

Vladimir Borisov, Andrei Demin, Anatoli Eltsov, Oleg Khristoforov, Yuriy Kiryukhin, Alexander Prokofiev, Aleksandr Vinokhodov, V. Vodchits

Proceedings Volume 5137, (2003) https://doi.org/10.1117/12.518066

KEYWORDS: Pulsed laser operation, Excimer lasers, Electrodes, High power lasers, Laser applications, Laser development, Ultraviolet radiation, Crystals, Laser crystals, Transistors

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Proceedings Article | 1 July 2002 Paper

Development of high-power EUV sources for lithography

Vladimir Borisov, Imtiaz Ahmad, S. Goetze, Alexander Ivanov, Oleg Khristoforov, Juergen Kleinschmidt, Vladimir Korobotchko, Jens Ringling, Guido Schriever, Uwe Stamm, Aleksandr Vinokhodov

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472338

KEYWORDS: Extreme ultraviolet, Plasma, Lithography, Spectrographs, Mirrors, Calibration, Metrology, Coded apertures, Visible radiation, Spectral resolution

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Proceedings Article | 1 July 2002 Paper

High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma

Uwe Stamm, Imtiaz Ahmad, Vladimir Borisov, Frank Flohrer, Kai Gaebel, S. Goetze, Alexander Ivanov, Oleg Khristoforov, Diethard Kloepfel, Peter Koehler, Juergen Kleinschmidt, Vladimir Korobotchko, Jens Ringling, Guido Schriever, Aleksandr Vinokhodov

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472283

KEYWORDS: Extreme ultraviolet, Plasma, Solids, Optical filters, Xenon, Calibration, Extreme ultraviolet lithography, Lithography, Liquids, Plasma generation

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Next generation semiconductor chip manufacturing using extreme ultraviolet (EUV) lithography requires a brilliant radiation source with output power between 50 W and 120 W in intermediate focus. This is about five to ten times higher power than that of current DUV excimer lasers used in optical lithography. Lifetime and cost of ownership however, need to be comparable to today's technology. In the present paper experimental results of both laser produced plasma and gas discharge produced plasma EUV source development at XTREME technologies - the EUV joint venture of Lambda Physik AG, Goettingen, and Jenoptik LOS GmbH, Jena, Germany - are presented. Source characterization has been performed with calibrated metrology tools for measurement of energy, power, size, spectra and stability of the EUV emission. The laser plasma investigations are performed with a 1st experimental facility comprising a commercial 40 W Nd:YAG laser coupled to a liquid xenon-jet target system, which was developed by XTREME technologies. The EUV in-band power emitted from the 0.25 mm diameter plasma into 2p solid angle is 0.2 W, the conversion efficiency amounts 0.5 percent. Estimated EUV emission parameters using a 500 W laser for plasma generation to be installed in spring 2002 are discussed. The gas discharge EUV sources described here are based on efficient Xenon Z-pinches. In the 3rd prototype generation the plasma pinch size and the available emission angle have been matched to the etendue of the optical system of 2-3 mm2. The solid angle of emission from the pinch of 1.3 mm x 1.5 mm amounts 1.8 sr. The Z-pinch EUV source can be operated continuously at 1000 Hz with an in-band output power of 10 W in 1.8 sr. This corresponds to 4.5 W in intermediate focus, if no spectral purity filter is needed. The power emitted into a solid angle of 2p sr is 35 W. Emission energy stability ranges between 1 percent and 4 percent standard deviation. Spectral, temporal as well as spatial emission characteristics of the discharge source in dependence on the gas discharge geometry have been evaluated. The potentials as well as limits for power scaling of the two technological source concepts are discussed.

Proceedings Article | 20 August 2001 Paper

Compact Z-pinch EUV source for photolithography

Guido Schriever, Manfred Rahe, Uwe Stamm, Dirk Basting, Oleg Khristoforov, Aleksandr Vinokhodov, Vladimir Borisov

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436716

KEYWORDS: Extreme ultraviolet, Plasma, Optical lithography, Optics manufacturing, Extreme ultraviolet lithography, Lithography, Electrodes, EUV optics, Chlorine, Signal detection

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Proceedings Article | 25 January 2001 Paper

Prospects for high-power high-repetition-rate industrial excimer lasers

Vladimir Borisov, Oleg Khristoforov, Yurii Kirykhin, Aleksandr Vinokhodov, Andrei Demin, V. Vodchits, A. Eltzov

Proceedings Volume 4184, (2001) https://doi.org/10.1117/12.414086

KEYWORDS: Excimer lasers, Ultraviolet radiation, Electrodes, High power lasers, Pulsed laser operation, Sapphire, Laser stabilization, Laser applications, Laser development, Fusion energy

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Proceedings Article | 22 December 1998 Paper

High-average-power excimer lasers

Vladimir Borisov, Andrei Demin, Oleg Khristoforov, Yurii Kirykhin, Aleksandr Vinokhodov, V. Vodchits, Dirk Basting, Uwe Stamm, Frank Voss, Igor Bragin

Proceedings Volume 3574, (1998) https://doi.org/10.1117/12.334492

KEYWORDS: Pulsed laser operation, Excimer lasers, Electrodes, Gas lasers, Ultraviolet radiation, Fluctuations and noise, Laser applications, Laser development, Inductance, Energy efficiency

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Proceedings Article | 4 April 1997 Paper

Theoretical and experimental investigations of the 1-kW XeCl laser with UV pre-ionization

Vladimir Borisov, Oleg Khristoforov, Yurii Kirykhin, Aleksandr Vinokhodov, Andrei Demin, Andrei Dem'yanov

Proceedings Volume 2987, (1997) https://doi.org/10.1117/12.271554

KEYWORDS: Electrodes, Pulsed laser operation, Gas lasers, Ultraviolet radiation, Electrons, Excimer lasers, Laser energy, Laser development, Energy efficiency, High power lasers

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Proceedings Article | 1 September 1991 Paper

Kilowatt-range high-repetition-rate excimer lasers

Vladimir Borisov, Oleg Khristoforov, Yurii Kirykhin, S. Kuznetsov, Yu. Stepanov, Aleksandr Vinokhodov

Proceedings Volume 1503, (1991) https://doi.org/10.1117/12.46961

KEYWORDS: Excimer lasers, Electrodes, Ultraviolet radiation, Pulsed laser operation, Gas lasers, Dielectrics, X-rays, High power lasers, Laser systems engineering, Laser applications

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Proceedings Article | 1 June 1990 Paper

Intense high-repetition-rate excimer lasers and applications

Vladimir Baranov, Vladimir Borisov, Aleksandr Vinokhodov, Yu. Kiryukhin, Yu. Stepanov, Oleg Khristoforov

Proceedings Volume 1225, (1990) https://doi.org/10.1117/12.18483

KEYWORDS: Excimer lasers, Electrodes, Gas lasers, Pulsed laser operation, Ultraviolet radiation, Plasma, Metals, Capacitors, X-rays, Information operations

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Showing 5 of 14 publications

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