Prof. Vladimir Dmitriev
Technology Manager at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Image processing, Scanners, Error analysis, Photomasks, Chemical elements, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Scanners, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 5 June 2018
Proc. SPIE. 10690, Optical Design and Engineering VII
KEYWORDS: Monochromatic aberrations, Optical design, Photomasks

SPIE Journal Paper | 9 June 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Image registration, Birefringence, Pulsed laser operation, Inspection, Calibration, Metrology, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Actuators, Lithography, Reticles, Metrology, Lithium, Image processing, Scanners, Image registration, Process control, Photomasks, Chemical elements, Semiconducting wafers, Yield improvement, Overlay metrology

Showing 5 of 23 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top