Prof. Vladimir Dmitriev
Technology Manager at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Scanners, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 5 June 2018
Proc. SPIE. 10690, Optical Design and Engineering VII
KEYWORDS: Monochromatic aberrations, Optical design, Photomasks

SPIE Journal Paper | 9 June 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Image registration, Birefringence, Pulsed laser operation, Inspection, Calibration, Metrology, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Actuators, Lithography, Reticles, Metrology, Lithium, Image processing, Scanners, Image registration, Process control, Photomasks, Chemical elements, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Actuators, Reticles, Metrology, Lithium, Scanners, Distortion, Image registration, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 29 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Quartz, Image processing, Scanners, Image registration, Pellicles, Data acquisition, Photomasks, Semiconducting wafers, Overlay metrology

Showing 5 of 22 publications
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