Dr. Vladimir B. Fleurov
Technical Project Manager at Cymer LLC
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Scanners, Coating, Manufacturing, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma, Tin

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical filters, Light sources, Optical lithography, Scanners, Spectrometers, Laser applications, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Scanners, Reflectivity, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D scanning, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Light sources, Deep ultraviolet, Modulation, Polarization, Scanners, Laser stabilization, Double patterning technology, Immersion lithography, High volume manufacturing

PROCEEDINGS ARTICLE | March 17, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Light sources, Scanners, Control systems, Laser scanners, Excimer lasers, Double patterning technology, Immersion lithography, 3D scanning, Semiconducting wafers, Pulsed laser operation

Showing 5 of 19 publications
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