Dr. Vladimir Jakubek
Postdoctoral Associate
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Polymers, Silicon, Resistance, Fluorine, Absorption, Chemically amplified resists

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