Dr. Volker A. Boegli
VP of Engineering at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Opacity, Etching, Quartz, Ultraviolet radiation, Silicon, Inspection, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Phase shifts

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Magnesium, Databases, Etching, Image processing, Image acquisition, Image resolution, Critical dimension metrology, Line edge roughness, Data conversion, Standards development

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beams, Magnesium, Opacity, Etching, Quartz, Chromium, Scanning electron microscopy, Photomasks, Binary data, Phase shifts

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Electron beams, Magnesium, Opacity, Etching, Quartz, Image processing, Chromium, Signal processing, Photomasks, Binary data

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Electron beams, Etching, Gases, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Spatial resolution, Ruthenium

Showing 5 of 9 publications
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