W. Miles Clift
at Sandia National Labs California
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Gold, Carbon, Sputter deposition, Ions, Silicon, Xenon, Silicon carbide, Molybdenum, Pulsed laser operation, Plasma

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Oxides, Multilayers, Electron beams, Silicon, Resistance, Reflectivity, Extreme ultraviolet lithography, Molybdenum, Ruthenium, Oxidation

Proceedings Article | 14 October 2004
Proc. SPIE. 5538, Optical Constants of Materials for UV to X-Ray Wavelengths
KEYWORDS: Carbon, Optical filters, Refractive index, Metals, Nickel, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Niobium, Zirconium

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Oxides, Mirrors, Electrons, Silicon, Reflectivity, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Oxidation

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Wafer-level optics, Contamination, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Plasma, Fiber optic illuminators, Oxidation

Showing 5 of 17 publications
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