Wen Chang Hsueh
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Inspection, Atomic force microscopy, Scanning electron microscopy, Frequency modulation, Photomasks, Extreme ultraviolet, Fermium, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 7 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Etching, Manufacturing, Inspection, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Defect inspection

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