Wakahiko Sakata
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Photomasks, Vestigial sideband modulation, Chemical mechanical planarization, Current controlled current source

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Defect detection, Manufacturing, Inspection, Chromium, Head, Photomasks, Optical proximity correction, SRAF, Data conversion, Defect inspection

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