Walid A. Tawfic
IC Design Consultant at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 31, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Process modeling, Data modeling, Calibration, Image processing, Optical proximity correction, Lithography, Semiconducting wafers, Geometrical optics, Printing, Integrated circuits

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Computer simulations, Optical simulations, Optical proximity correction, Resolution enhancement technologies, Printing, Photomasks, Semiconducting wafers, Control systems, Visualization, Model-based design

PROCEEDINGS ARTICLE | March 28, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Calibration, Data modeling, Image processing, Process modeling, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Feature extraction, Optical lithography, Printing

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