Mr. Walid A. Tawfic
IC Design Consultant at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 31, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Printing, Integrated circuits, Optical proximity correction, Geometrical optics, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Visualization, Control systems, Computer simulations, Printing, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 28, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Optical lithography, Data modeling, Calibration, Image processing, Feature extraction, Scanning electron microscopy, Printing, Optical proximity correction, Photoresist processing, Process modeling

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