Mr. Wallace P. Printz
Process Engineer at Tokyo Electron America Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Polymers, Capillaries, Finite element methods, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers, Polymer thin films, Protactinium

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Calibration, Image processing, Diffusion, Chemistry, Printing, Double patterning technology, Critical dimension metrology, Photoresist processing, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Image processing, Scanners, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Double patterning technology, Photoresist processing

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