Dr. Walter D. Mieher
at KLA Corp
SPIE Involvement:
Publications (6)

Proceedings Article | 8 November 2012 Paper
Jeff Sun, Anthony Cheung, Jason Yang, Paul Petric, Allen Carroll, Layton Hale, Walter Mieher, John Hench, Mark McCord, Shinichi Kojima, Regina Freed, Chris Bevis, Thomas Gubiotti, Upendra Ummethala
Proceedings Volume 8522, 85221J (2012) https://doi.org/10.1117/12.964978
KEYWORDS: Electron beam lithography, Lithography, Semiconducting wafers, Reflectivity, Logic, YAG lasers, Direct write lithography, Wafer-level optics, Computer aided design, Electron beams

Proceedings Article | 21 March 2012 Paper
Wen-Chuan Wang, Shy-Jay Lin, Regina Freed, Thomas Gubiotti, Layton Hale, Francoise Kidwingira, Shinichi Kojima, Chris Bevis, Jeff Sun, Jason Yang, Walter Mieher, John Hench, Upendra Ummethala
Proceedings Volume 8323, 83230H (2012) https://doi.org/10.1117/12.916090
KEYWORDS: Electron beam lithography, Semiconducting wafers, Electroluminescence, Lithography, Monte Carlo methods, Reflectivity, Electron beams, Direct write lithography, Silicon, Computer aided design

Proceedings Article | 24 March 2008 Paper
Walter Mieher, John Fielden, Vera Zhuang, John Hench, Ted Dziura, Daniel Wack, Leonid Poslavsky
Proceedings Volume 6922, 69221N (2008) https://doi.org/10.1117/12.772997
KEYWORDS: Metrology, Process control, Etching, Critical dimension metrology, Systems modeling, Spectroscopy, Double patterning technology, Optical lithography, Performance modeling, Reflectometry

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521W (2006) https://doi.org/10.1117/12.655746
KEYWORDS: Single crystal X-ray diffraction, Semiconducting wafers, Data modeling, Scatterometry, Finite element methods, Lithography, Metrology, Process control, Photoresist processing, Scatter measurement

Proceedings Article | 16 July 2002 Paper
Paola DeCecco, Thaddeus Dziura, Walter Mieher, Ady Levy, Xuemei Chen
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473424
KEYWORDS: Single crystal X-ray diffraction, Semiconducting wafers, Photoresist processing, Lithography, Critical dimension metrology, Process control, Metrology, Spectroscopy, Wafer testing, Reticles

Showing 5 of 6 publications
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