Walter Wang
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Materials processing, Manufacturing, Extreme ultraviolet, Double patterning technology, Overlay metrology

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Polymers, Ultraviolet radiation, Diffusion, Amplifiers, Double patterning technology, Chemical reactions, Thin film coatings, Photoresist processing, Industrial chemicals

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Reticles, Manufacturing, Transmittance, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Current controlled current source

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