Dr. Wan-Soo Kim
at Qoniac GmbH
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Metrology, Statistical analysis, Data modeling, Computer simulations, Neodymium, Semiconducting wafers, Statistical modeling, Performance modeling, Data corrections, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Critical dimension metrology, Statistical modeling, Data corrections

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Oxides, Etching, Metals, Copper, Resistance, Capacitance, Photomasks, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Metrology, Environmental monitoring, Optical lithography, Etching, Image processing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Statistical analysis, Data modeling, Metals, Reliability, Distortion, Process control, Optical alignment, Virtual reality, Semiconducting wafers, Environmental sensing, Overlay metrology, Model-based design, Back end of line, Front end of line

Showing 5 of 6 publications
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