Dr. Wang Yueh
Principal Engineer
SPIE Involvement:
Publications (27)

Proceedings Article | 23 March 2010 Paper
Idriss Blakey, Anguang Yu, James Blinco, Kevin Jack, Heping Liu, Michael Leeson, Wang Yueh, Todd Younkin, Andrew Whittaker
Proceedings Volume 7636, 763635 (2010) https://doi.org/10.1117/12.853620
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Absorbance, Optical lithography, Semiconducting wafers, Carbonates, Scanning electron microscopy, Photoresist materials

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555
KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733Q (2009) https://doi.org/10.1117/12.814308
KEYWORDS: Amplifiers, Line edge roughness, Lithography, Extreme ultraviolet lithography, Molecules, Oxygen, Thermal modeling, Thermodynamics, Photoresist materials, Polymers

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 69232F (2008) https://doi.org/10.1117/12.782634
KEYWORDS: Polymers, Polymer thin films, Ionization, Picosecond phenomena, Deep ultraviolet, Absorption, Photoresist materials, Molecules, Matrices, Photolysis

Proceedings Article | 27 March 2008 Paper
Proceedings Volume 6923, 69230K (2008) https://doi.org/10.1117/12.773570
KEYWORDS: Molecules, Line edge roughness, Glasses, Diffusion, Image resolution, Deep ultraviolet, Polymers, Extreme ultraviolet lithography, Etching, Chemically amplified resists

Showing 5 of 27 publications
Conference Committee Involvement (2)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
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