Dr. Wang Yueh
at
SPIE Involvement:
Conference Program Committee | Author
Publications (27)

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Optical lithography, Polymers, Scanning electron microscopy, Carbonates, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Molecules, Amplifiers, Oxygen, Photoresist materials, Extreme ultraviolet lithography, Line edge roughness, Thermal modeling, Thermodynamics

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Switches, Deep ultraviolet, Polymers, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Deep ultraviolet, Polymers, Matrices, Molecules, Photoresist materials, Ionization, Picosecond phenomena, Photolysis, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | March 27, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Deep ultraviolet, Etching, Polymers, Glasses, Molecules, Diffusion, Image resolution, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Silicon, Scanning electron microscopy, NOx, Extreme ultraviolet lithography, Line edge roughness, Polymer thin films, Absorption

Showing 5 of 27 publications
Conference Committee Involvement (2)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
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