Wataru Shibayama
at Nissan Chemical Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 12 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Carbon, Lithography, Etching, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, System on a chip

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Polymers, Materials processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Etching, Dry etching, Polymers, Materials processing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Carbon, Optical lithography, Contamination, Etching, Materials processing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, System on a chip

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Silicon, Materials processing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, System on a chip

Showing 5 of 11 publications
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