Waut Drent
at IMEC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Particles, Inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 13 March 2018 Presentation + Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Ultraviolet radiation, Annealing, Photoresist materials, Line width roughness, Line edge roughness, Semiconducting wafers

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