Dr. Wayne M. Lytle
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Publications (8)

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Lithography, Chemical species, Particles, Electrons, Ions, Photomasks, Extreme ultraviolet, Helium, Plasma

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Chemical species, Sputter deposition, Particles, Electrons, Ions, Photomasks, Helium, Semiconducting wafers, Plasma

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Contamination, Chemical species, Particles, Silicon, Photomasks, Extreme ultraviolet lithography, Helium, Semiconducting wafers, Plasma

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Chemical species, Particles, Silicon, Photomasks, Extreme ultraviolet lithography, Helium, Semiconducting wafers, Atmospheric particles, Plasma

Proceedings Article | 9 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Contamination, Particles, Dielectrics, Electrons, Silicon, Photomasks, Extreme ultraviolet, Semiconducting wafers, Ruthenium, Plasma

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Contamination, Capacitors, Sputter deposition, Particles, Electrons, Ions, Process control, Extreme ultraviolet, Ruthenium, Plasma

Showing 5 of 8 publications
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