Dr. Wayne Zhou
at KLA China
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Photovoltaics, 3D acquisition, Scanning electron microscopy, Optimization (mathematics), Semiconducting wafers, Overlay metrology, Imaging metrology, 3D image processing

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Metrology, Diffractive optical elements, Imaging systems, Manufacturing, Quality measurement, Scanning electron microscopy, Scatterometry, Semiconducting wafers, Overlay metrology

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