Wei-Ming He
Principal Engineer at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Carbon, Lithography, Metrology, Optical lithography, Etching, Image segmentation, Image processing, Process control, Photomasks, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Etching, Chemical vapor deposition, Photoresist materials, Process control, Integrated circuits, Critical dimension metrology, Stress analysis, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 10, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Optical lithography, Image processing, Manufacturing, Photoresist materials, Photomasks, Double patterning technology, Immersion lithography, Semiconducting wafers, Natural surfaces, Photoresist developing

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Electron beams, Metals, Inspection, Electron microscopes, Control systems, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology

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