Dr. Wei-Su Chen
Project Manager at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | March 25, 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Optical lithography, Etching, Photoresist materials, Photomasks, Phase shifts, Photoresist developing, Modulation, Double patterning technology, Distortion, Anisotropic etching

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Electron beam lithography, Optical lithography, Modulation, Etching, Phase shift keying, Photoresist materials, Photomasks, Double patterning technology, Immersion lithography, Phase shifts

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Oxides, Electron beam lithography, Point spread functions, Modulation, Backscatter, Scattering, Laser scattering, Image resolution, Critical dimension metrology, Standards development

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8685, Advanced Etch Technology for Nanopatterning II
KEYWORDS: Oxides, Electron beam lithography, Cadmium, Etching, Image processing, Resistance, Scanning electron microscopy, Atomic layer deposition, Critical dimension metrology, Tin

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Carbon, Electron beam lithography, Cadmium, Etching, Plasmas, Coating, Image resolution, Photomasks, Plasma etching, Fluorine

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Cadmium, Etching, Dry etching, Metals, Image processing, Oxygen, Scanning electron microscopy, Plasma etching, Photoresist processing, Plasma

Showing 5 of 18 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top