Dr. Wei-Su Chen
Project Manager at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | 25 March 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Optical lithography, Etching, Photoresist materials, Photomasks, Phase shifts, Photoresist developing, Modulation, Double patterning technology, Distortion, Anisotropic etching

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Electron beam lithography, Optical lithography, Modulation, Etching, Phase shift keying, Photoresist materials, Photomasks, Double patterning technology, Immersion lithography, Phase shifts

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Oxides, Electron beam lithography, Point spread functions, Modulation, Backscatter, Scattering, Laser scattering, Image resolution, Critical dimension metrology, Standards development

Proceedings Article | 29 March 2013
Proc. SPIE. 8685, Advanced Etch Technology for Nanopatterning II
KEYWORDS: Oxides, Electron beam lithography, Cadmium, Etching, Image processing, Resistance, Scanning electron microscopy, Atomic layer deposition, Critical dimension metrology, Tin

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Carbon, Electron beam lithography, Cadmium, Etching, Plasmas, Coating, Image resolution, Photomasks, Plasma etching, Fluorine

Showing 5 of 18 publications
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