Wei-Te Hsu
at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Confocal microscopy, Infrared imaging, Metrology, Metals, Copper, Silicon, Reflectivity, Reflectometry, 3D metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 27, 2011
Proc. SPIE. 8082, Optical Measurement Systems for Industrial Inspection VII
KEYWORDS: Thin films, Metrology, Reflection, Etching, Spectroscopy, Silicon, Inspection, Reflectivity, Scanning electron microscopy, Reflectometry

PROCEEDINGS ARTICLE | May 27, 2011
Proc. SPIE. 8082, Optical Measurement Systems for Industrial Inspection VII
KEYWORDS: Confocal microscopy, Microscopes, Metrology, Metals, Annealing, Copper, Silicon, Reflectivity, 3D metrology, Semiconducting wafers

SPIE Journal Paper | December 1, 2009
OE Vol. 48 Issue 12
KEYWORDS: Overlay metrology, Diffraction, Scatterometry, Scatter measurement, Critical dimension metrology, Optical engineering, Detection and tracking algorithms, Diffraction gratings, Photoresist materials, Semiconductors

PROCEEDINGS ARTICLE | September 10, 2009
Proc. SPIE. 7432, Optical Inspection and Metrology for Non-Optics Industries
KEYWORDS: Microscopes, Diffraction, Metrology, Imaging systems, Reflectivity, Scatterometry, Fresnel lenses, Scatter measurement, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | August 21, 2009
Proc. SPIE. 7405, Instrumentation, Metrology, and Standards for Nanomanufacturing III
KEYWORDS: Diffraction, Photoresist materials, Scatterometry, Signal processing, Critical dimension metrology, Scatter measurement, Electromagnetism, Overlay metrology, Model-based design, Diffraction gratings

Showing 5 of 9 publications
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