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Wei Liu
at Huazhong Univ of Science and Technology
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Publications (1)
SPIE Journal Paper | 1 April 2011
Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlation
Shiyuan Liu, Wei Liu, Tingting Zhou
JM3, Vol. 10, Issue 02, 023007, (April 2011) https://doi.org/10.1117/12.10.1117/1.3586797
KEYWORDS: Optical lithography, Binary data, Phase shifts, Imaging systems, Photomasks, Computer simulations, Lithography, Coherence imaging, Algorithm development, Systems modeling
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