Dr. Wei Liu
Principal Engineer at ASML San Jose
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Finite-difference time-domain method, Deep ultraviolet, Reflectivity, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Apodization, Multilayers, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Data modeling, Reflection, Reflectivity, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Manufacturing, Electroluminescence, Photomasks, Logic devices, Source mask optimization, SRAF, Fiber optic illuminators

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top