Dr. Wei Liu
Senior Process Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 29 April 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Metrology, Optical lithography, Data modeling, Etching, Control systems, Scatterometry, Process control, Feedback loops, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Reflectivity, Scanning electron microscopy, Photomasks, Optical alignment, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Carbon, Lithography, Antireflective coatings, Optical lithography, Etching, Reflectivity, Photoresist materials, Photomasks, Critical dimension metrology, 193nm lithography

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Diffraction, Spectroscopy, Reflectivity, Polarizers, Scanning electron microscopy, Photoresist materials, Finite element methods, Critical dimension metrology, Semiconducting wafers, Diffraction gratings

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