Dr. Wei Zhou
Director of Optical Testing at Huawei
SPIE Involvement:
Author | Science Fair Judge
Publications (6)

Proceedings Article | 20 September 2013
Proc. SPIE. 8819, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
KEYWORDS: Semiconductors, Signal to noise ratio, Imaging systems, Cameras, Sensors, Inspection, Image resolution, CMOS technology, Neodymium, Content addressable memory

Proceedings Article | 20 September 2013
Proc. SPIE. 8819, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
KEYWORDS: Semiconductors, Light emitting diodes, Waveguides, Silicon, Manufacturing, Inspection, Collimators, Collimation, Geometrical optics, Semiconducting wafers

Proceedings Article | 6 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Signal to noise ratio, Indium gallium arsenide, Metrology, Imaging systems, Cameras, Silicon, Inspection, Semiconducting wafers, Device simulation

Proceedings Article | 24 September 2011
Proc. SPIE. 8170, Illumination Optics II
KEYWORDS: Semiconductors, Microscopes, Photons, Laser applications, Inspection, Laser beam propagation, Semiconductor lasers, Semiconducting wafers, Signal detection, Systems modeling

Proceedings Article | 20 September 2011
Proc. SPIE. 8105, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V
KEYWORDS: Signal to noise ratio, Reflection, Imaging systems, Sensors, Image processing, Silicon, Inspection, Machine vision, Human vision and color perception, Semiconducting wafers

Showing 5 of 6 publications
Conference Committee Involvement (3)
Instrumentation, Metrology, and Standards for Nanomanufacturing VIII
20 August 2014 | San Diego, California, United States
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
28 August 2013 | San Diego, California, United States
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
13 August 2012 | San Diego, California, United States
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