A comprehensive polarization aberration function is proposed to evaluate the imaging quality of a perturbed high NA
lithographic lens. In this function, the system polarization aberration, i.e. Jones matrix, is decomposed into several basic
parts as wavefront aberration, apodization, diattenuation, retardance and rotation by single value decomposition (SVD).
The wavefront aberration is described by field-Zernike polynomials (FZP), and the diattenuation, as well as retardance,
is described by field-orientation Zernike polynomials (FOZP). The relationship of system polarization aberration with
pupil, field and manufacturing errors is established by an approximately analytical equation, which provides a possible
way to analyze lens tolerance for polarization aberration.