Weicheng Hsu
at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Extreme ultraviolet, Double patterning technology, Optical alignment, Line edge roughness, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Scanners, Photomasks, Double patterning technology, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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