The random antireflective structures are modeled by the analysis of the random morphology distribution. According to the effective medium theory, the transmission of the antireflective structure is calculated by dividing the structure into multilayer, and the dependence on parameters of the subwavelength is analyzed in detail. In the single-variable condition, etching depth, half breadth of distribution, and median of distribution get a positive correlation with the transmittance where the etching depth plays a most important part in enhancing the transmittance, whereas the angle of structures gets a negative correlation. The experimental results coincide well with the calculation and analysis. The analysis offers a theory guidance to fabricate random subwavelength antireflected structures using metal dewetting.
A theoretical model is proposed to analyze the fabrication of metal nanopartical resist by metal nanofilm annealing, which is used in the manufacture of the transmission-enhanced subwavelength structures at the interface of the optical glass. Based on the conservation of volume of the metal before annealing and after heat treatment, the theoretical relationships of the structure parameters between the metal nanofilm and the metal nanoparticles are obtained. The experimental results coincide well with the theory model, which offers a theoretical guidance to fabricate subwavelength antireflected structures with the advantage of low cost achieved through metal nanofilm annealing. By this means, the average transmission of the quartz device intensifies to 97.9% for the structures fabricated on the both sides compared with the 93% for the unstructured one.