Dr. Weijie Shi
at Shanghai Institute of Optics and Fine Mechanics
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 19 May 2006
Proc. SPIE. 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Fluctuations and noise, Coherence (optics), Optical testing, Ray tracing, Projection systems, Optical alignment, Semiconducting wafers

Proceedings Article | 19 May 2006
Proc. SPIE. 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
KEYWORDS: Wafer-level optics, Lithography, Metrology, Optical lithography, Interferometers, Interferometry, Optical testing, Time metrology, Semiconducting wafers, Tolerancing

SPIE Journal Paper | 1 May 2006
OE Vol. 45 Issue 05
KEYWORDS: Adaptive optics, Optical alignment, Projection systems, Lithography, Semiconducting wafers, Imaging systems, Image quality, Distortion, Monochromatic aberrations, Optical engineering

Proceedings Article | 27 January 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Calibration, Adaptive optics, Image quality, Line width roughness, Optical alignment, Photoresist processing, Semiconducting wafers

Proceedings Article | 27 January 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Diffraction, Monochromatic aberrations, Phase shifting, Coherence (optics), Wavefronts, Image sensors, Photomasks, Semiconducting wafers, Binary data, Resolution enhancement technologies

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top