Mr. Weiling Kang
at Peking Univ Shenzhen Graduate School
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Carbon, Magnesium, Optical lithography, Statistical analysis, Etching, Feature extraction, Photomasks, Critical dimension metrology, Algorithm development, Back end of line

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Carbon, Lithography, Logic, Optical lithography, Etching, Scanners, Photomasks, Failure analysis, Process modeling, Phase only filters

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Logic, Magnesium, Optical lithography, Detection and tracking algorithms, Feature extraction, Photomasks, Directed self assembly, Critical dimension metrology, Algorithm development, Electronic design automation

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Semiconductors, Logic, Magnesium, Optical lithography, Detection and tracking algorithms, Feature extraction, Photomasks, Electronics engineering, Computer engineering, Algorithm development

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Oxides, Lithography, Interfaces, Doping, Differential equations, Line width roughness, TCAD, Performance modeling, Instrument modeling

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Oxides, Carbon, Lithography, Optical lithography, Etching, Dry etching, Silicon, Photomasks, Line width roughness, Wet etching

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top