Dr. Weilun Chao
Group Leader at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (41)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Thin films, Nanostructures, Diffraction, Coherence imaging, Nanostructuring, Nickel, Silicon, Wave propagation, Extreme ultraviolet, Acoustics

PROCEEDINGS ARTICLE | October 27, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Microscopes, Reticles, Modulation, Imaging systems, Lenses, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical components, Electron beam lithography, Optical design, Reflection, Silicon, Atomic layer deposition, Extreme ultraviolet, Molybdenum, Structural engineering, Phase shifts

PROCEEDINGS ARTICLE | June 16, 2017
Proc. SPIE. 10243, X-ray Lasers and Coherent X-ray Sources: Development and Applications
KEYWORDS: Oxides, Argon, Glasses, Nickel, Ions, Mass spectrometry, Laser ablation, X-ray lasers, Zone plates, Scandium

PROCEEDINGS ARTICLE | September 9, 2016
Proc. SPIE. 9965, Adaptive X-Ray Optics IV
KEYWORDS: Signal to noise ratio, Fringe analysis, X-ray optics, Metrology, Interferometers, Sensors, Calibration, Photons, X-rays, Charge-coupled devices

SPIE Journal Paper | July 12, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

Showing 5 of 41 publications
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