Dr. Weimin Gao
at Synopsys Inc
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Image processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Reflectors, Reticles, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Scattering, Light scattering, Manufacturing, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Silicon, Reflectivity, Near field, Photomasks, Extreme ultraviolet, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Data modeling, Polymers, Particles, Diffusion, 3D modeling, Photoresist processing, Process modeling, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Optical lithography, Data modeling, Calibration, Resistance, 3D modeling, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Showing 5 of 24 publications
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